Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments
نویسندگان
چکیده
during thermal annealing experiments F. Kail, J. Farjas, P. Roura, C. Secouard, O. Nos, J. Bertomeu, F. Alzina, and P. Roca i Cabarrocas Department of Physics, GRMT, University of Girona, Montilivi Campus, E17071 Girona, Catalonia, Spain LTS, CEA Grenoble, 17 rue des Martyrs, 38054 Grenoble Cedex, France Dept. Fisica Aplicada and Optica, University of Barcelona, E-08028 Barcelona, Spain Institut Català de Nanotecnologia (ICN), Campus de la UAB, 08193 Bellaterra, Spain LPICM, Ecole Polytechnique, 91128 Palaiseau, France
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